Silicon Nanowires is a new class of materials that have attracted attention and great research interest in the last few years because of their great potential applications in nanotechnology such as nanoelectronic, nanomechanical and biomedical engineering. Fabrication of Silicon Nanowires is one of the great challenges today. Conventional lithography methods are not capable to produce Nanowires and even with advance nanolithography sizes below 100 nm may not easily be achieved. The goal of this project is to form and produce very small Silicon Nanowires using a Top-Down Nanofabrication Method which involved Scanning Electron Microscope (SEM) based Electron Beam Lithography (EBL) method. Initially, the Top-Down Nanofabrication Method based on EBL was the design of the Nanowires Pattern Design (NPD). The NPD has been done by software called RAITH ELPHY Quantum GDSII Editor. Next, the nanofabrication process flow development which consists of the detailed parameters and recipes are developed. Finally, the dimensions, developments and etch profiles of Siliocn Nanowires was investigated using High Power Microscope (HPM), imaging by Scanning Electron Microscope (SEM) and surface topography by Atomic Force Microscope (AFM).